iCVD Topcoat for Sub-10nm Patterning with Directed Self-Assembly of Block Copolymer Film

Presenter: 

Do Han Kim

Authors: 

Kim, D. H.; Suh, H. S; Moni, P.; Xiong, S.; Ocola, L. C.; Nealey, P. F.; Gleason, K. K.

Author Affiliation: 

Massachusetts Institute of Technology, University of Chicago, Argonne National Laboratory

Abstract: 

In technique of initiated CVD (iCVD), monomer and initiator vapors flow into a vacuum chamber. The resistively heated hot filaments in the chamber break the initiator into free-radicals. Subsequently, polymeric film growth begins on cooled substrates through free-radical polymerization of monomer. We introduce iCVD films as an effective top-coat in directed self-assembly (chemoexpitaxy) to create scalable sub-10 nm patterns. One of the benefits of vapor deposition is the ability to form smooth and pinhole-free ultrathin films. The iCVD layers, <10 nm thick, were successfully deposited as a top-coat on block copolymers (BCPs). In combination with BCPs displaying strongly segmenting domains (high _), the iCVD top-coat enabled resolution of sub-10 nm patterns by directed self-assembly. This presentation will show and discuss on the concept of iCVD top-coat, sub-10 nm patterns driven by iCVD top-coat, and spectroscopic observations in comparison with a conventional solution-cast films applied by spin-coating.